DISPLAY SUBSTRATE AND METHOD OF MEASURING PATTERN DIMENSIONS OF DISPLAY SUBSTRATE

摘要

A display panel includes a plurality of pixel areas and at least one inspection area. An incident light is irradiated onto an inspection pattern disposed in the inspection area and a reflection light reflected by the inspection pattern is detected. An optical critical dimension of the inspection pattern is calculated from the reflection light, and a dimension of a pixel pattern disposed in each pixel area is calculated from the optical critical dimension of the inspection pattern. Accordingly, the dimension of the pixel pattern may be indirectly measured from the inspection pattern.

主权项

1. A method of measuring a pattern dimension of a display substrate, comprising:
irradiating incident light onto an inspection pattern of a display substrate, the display substrate including a plurality of pixel areas and one or more inspection areas, the inspection pattern being disposed in at least one inspection area of the inspection areas; detecting reflection light reflected by the inspection pattern; calculating an optical critical dimension of the inspection pattern from the reflection light; and calculating a dimension of a pixel pattern disposed in each of the pixel areas from the optical critical dimension of the inspection pattern.