发明名称 MONITORING SYSTEM BASED ON ETCHING OF METALS
摘要 Compositions, devices and processes related to etching of a very thin layer or fine particles of a metal are disclosed for monitoring a variety of parameters, such as time, temperature, time-temperature, thawing, freezing, microwave, humidity, ionizing radiation, sterilization and chemicals. These devices have capabilities of producing a long and sharp induction period of an irreversible visual change. The devices are composed of an indicator comprising a very thin layer of a metal and an activator, e.g., a reactant, such as water, water vapor, an acid, a base, oxidizing agent or their precursors, which is capable of reacting with the said indicator. Ink formulations composed of a metal powder and a proper activator can be used for monitoring several sterilization processes, such as sterilization with steam. When water is used as an activator, a thin layer of metals, such as that of aluminum can be used as steam sterilization or humidity indicator.
申请公布号 US2014154808(A1) 申请公布日期 2014.06.05
申请号 US201213692939 申请日期 2012.12.03
申请人 Patel Gordhanbhai N. 发明人 Patel Gordhanbhai N.
分类号 G01N21/77 主分类号 G01N21/77
代理机构 代理人
主权项 1. An indicating system comprising: an indicating layer comprising a zero-valent metal or metal alloy and metal oxide; and an activator layer comprising an activator or a precursor of said activator wherein said activator or said precursor of said activator renders said indicator layer transparent upon reaction, and the system is capable of providing an induction period.
地址 Somerset NJ US