发明名称 Treatment System and Method for Removing Halogenated Compounds from Contaminated Systems
摘要 A treatment system and a method for removal of at least one halogenated compound, such as PCBs, found in contaminated systems are provided. The treatment system includes a polymer blanket for receiving at least one non-polar solvent. The halogenated compound permeates into or through a wall of the polymer blanket where it is solubilized with at least one non-polar solvent received by said polymer blanket forming a halogenated solvent mixture. This treatment system and method provides for the in situ removal of halogenated compounds from the contaminated system. In one embodiment, the halogenated solvent mixture is subjected to subsequent processes which destroy and/or degrade the halogenated compound.
申请公布号 US2014155676(A1) 申请公布日期 2014.06.05
申请号 US201313895717 申请日期 2013.05.16
申请人 United States of America as Represented by the Administrator of the National Aeronautics and Spac 发明人 Quinn Jacqueline W.;Clausen Christian A.;Yestrebsky Cherie L.
分类号 B01D11/04;B01D71/42;A62D3/34;B09C1/02;B09C1/08;C02F1/44;B01D71/24 主分类号 B01D11/04
代理机构 代理人
主权项 1. A treatment system for the removal of at least one halogenated compound comprising: a polymer blanket formed from a polymer which provides for the permeation of at least one halogenated compound into and/or through a wall of said polymer blanket; and at least one non-polar solvent received by said polymer blanket, wherein said non-polar solvent solubilizes at least one halogenated compound that permeates into and/or through said polymer blanket.
地址 Washington DC US