| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrode structure having excellent electrical resistivity, high reflectivity comparable to an Ag alloy film (single layer), and facilitating high accuracy microfabrication.SOLUTION: An electrode for use in a display device or an input device has a laminated film including a first layer composed of an Al alloy and formed on the substrate side, and a second layer formed thereon and composed of an Ag alloy. The electrode has a thickness of 100-800 nm, the second layer has a thickness of 60-480 nm, the thickness ratio of the second layer occupying the thickness of the electrode is 10-70%, and the thickness ratio of the first layer occupying the thickness of the electrode is 30% or more. The Al alloy contains, as an alloy element, a predetermined amount of at least one kind selected from a group consisting of: rare earth element; at least one kind selected from a group consisting of Si, Cu, and Ge; and at least one kind selected from a group consisting of Ti, Ta, W and Nb. |
