发明名称 PRODUCTION METHOD OF VAPOR DEPOSITION MASK
摘要 <p>PROBLEM TO BE SOLVED: To shorten a laser processing time of an opening pattern.SOLUTION: In a production method of a vapor deposition mask in which a member for a mask is formed, which is obtained by bringing close to a resin film 4, a magnetic metal member 2 provided with a plurality of through holes 1 having a larger shape dimension than a thin film pattern on a position corresponding to the plurality of thin film patterns to be formed by vapor deposition, and then the film 4 part in each through hole 1 is irradiated with laser light L, and an opening pattern 3 having the same shape dimension as the thin film pattern is laser-processed on a position corresponding to the thin film pattern, laser processing of the opening pattern 3 is performed by irradiating each side of the opening pattern to be formed with striped laser light L having a narrower width than the opening pattern 3.</p>
申请公布号 JP2014101539(A) 申请公布日期 2014.06.05
申请号 JP20120253232 申请日期 2012.11.19
申请人 V TECHNOLOGY CO LTD 发明人 KAJIYAMA KOICHI;MIZUMURA MICHINOBU;HONEY MAHAL AZIZ;KAJIYAMA YOSHITAKA
分类号 C23C14/04;H01L51/50;H05B33/10;H05B33/12 主分类号 C23C14/04
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