SELF-RECOVERABLE NANO-PATTERN STRUCTURE COMPRISING SHAPE MEMORY POLYMER AND PREPARATION METHOD THEREOF

摘要

The present invention relates to a self-recoverable nano-pattern structure comprising shape memory polymer and a preparation method thereof and, more specifically, to a self-recoverable nano-pattern structure comprising shape memory polymer with enhanced long term durability which can self-recover through heat or UV absorption manufactured through a casting nanoimprint method using a mixed solution of shape memory polymer and fullerene, and to a preparation method thereof. The self-recoverable nano-pattern structure: has long term durability by including the shape memory polymer, thereby being able to self-recover even when transformed by external shock; and includes fullerene, thereby being able to self-recover through UV absorption by UV exposure without a separate process. In addition, the self-recoverable nano-pattern structure can manufacture a transparent nano-pattern structure through the casting nanoimprinting method using a solvent, thereby being able to be applied to display or exterior building material industries.