| 摘要 |
PROBLEM TO BE SOLVED: To easily form a solid state imaging element which can reduce white spot defects at the time of manufacturing and prevent deterioration in the smear level.SOLUTION: In a solid state imaging element (1), an anti-reflection film (5) is formed on a semiconductor substrate (2) in a region except an electrode (4) to have a flat top surface, and a whole area of an end of a light-shielding film (7) to form an opening (13) in the light-shielding film (13) overlaps the anti-reflection film (5). |
