| 发明名称 |
PROCESS CHAMBER GAS FLOW APPARATUS, SYSTEMS, AND METHODS |
| 摘要 |
Process chamber gas flow control apparatus having a tiltable valve are disclosed. The gas flow apparatus includes a process chamber adapted to contain a substrate, an exit from the process chamber including a valve seat, and a tiltable valve configured and adapted to tilt relative to the valve seat to control flow non-uniformities within the process chamber. Systems and methods including the tiltable valve apparatus are disclosed, as are numerous other aspects. |
| 申请公布号 |
US2014150878(A1) |
申请公布日期 |
2014.06.05 |
| 申请号 |
US201314091130 |
申请日期 |
2013.11.26 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
Merry Nir;Sapkale Chandrakant M.;Muthukamtchi Karuppasamy;Hudgens Jeffrey C.;Kankanala Penchala N. |
| 分类号 |
F16K51/00 |
主分类号 |
F16K51/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A process chamber gas flow control apparatus, comprising:
a process chamber adapted to contain a substrate; an exit from the process chamber including a valve seat; and a tiltable valve configured and adapted to tilt relative to the valve seat to control a gas flow pattern within the process chamber.
|
| 地址 |
Santa Clara CA US |
