| 摘要 |
<p>Disclosed is a resist composition generating an acid by exposure and changing the solubility thereof with respect to a developing solution by the action of the acid. The resist composition includes a base component (A) of which solubility with respect to the developing solution may change by the action of the acid. (A) includes a polymer compound (A1) having a constituent unit (a0) represented by Formula (a0-1), a constituent unit (a2) including a lactone-containing cyclic group, a -SO_2-containing cyclic group or a carbonate-containing cyclic group, and a constituent unit (a1) including an acid decomposable group of which polarity is increased by the action of the acid. The weight average molecular weight of (A1) is less than or equal to 6,000. [Ra^1 is a monovalent substituent having a polymerizable group, La^1 is O, S, a methylene group, R^1 is a hydrocarbon group or a cyclic hydrocarbon group of C_1-20 having a linear chain or a branched chain, and n is an integer from 0 to 5.].</p> |
