METHOD FOR MANUFACTURING TEMPLATE FOR NANOIMPRINT

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a template for nanoimprint, by which transfer patterns in various sizes can be formed with a high yield in a simpler process while employing a side-wall process.SOLUTION: A resist pattern is used for a core material to be used in a side-wall process; and an atomic layer deposition film is used for a thin film that covers the core material. First, a thick film pattern portion to be a transfer pattern in a desired large size is formed in a hard mask layer, and then a side-wall pattern to be a transfer pattern in a small size is formed by using the side-wall process.