发明名称 SELF-ASSEMBLED STRUCTURE, METHOD OF MANUFACTURING THE SAME AND ARTICLE COMPRISING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide a self-assembled structure in a graft block copolymer having an average largest width or thickness of less than 60 nm as well as showing a periodicity of less than 60 nm, and a method for manufacturing the structure, and an article comprising the structure.SOLUTION: A copolymer is disclosed, comprising a backbone polymer and a first graft polymer, in which the first graft polymer comprises a surface energy reducing moiety; the first graft polymer is grafted onto the backbone polymer; and the surface energy reducing moiety comprises a fluorine atom, a silicon atom, or a combination of a fluorine atom and a silicon atom. The backbone polymer is polynorbornene; and the first graft polymer is a poly(fluorostyrene), a poly(tetrafluoro-hydroxy styrene), or a combination of these.</p>
申请公布号 JP2014101512(A) 申请公布日期 2014.06.05
申请号 JP20130237764 申请日期 2013.11.18
申请人 ROHM &amp, HAAS ELECTRONIC MATERIALS LLC;TEXAS A &amp, M UNIV SYSTEM 发明人 THACKERAY JAMES W;TREFONAS PETER III;SANGHO CHO;GUORONG SUN;KAREN WOOLEY
分类号 C08F255/00 主分类号 C08F255/00
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