POLYMERIZATION METHOD OF POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

The present invention relates to a method for polymerizing a polymer compound (A1) having a constituting unit (a0) which is induced from a compound represented by Formula (a0-1), wherein the polymer compound is polymerized using a mixed solvent containing 10 wt% or more of one or more solvents selected from the group consisting of a ring-type ketone-based solvent, an ester-based solvent, and a lactone-based solvent. [In Formula (a0-1), Ra1 is a monovalent substituent having a polymerizable group; La1 is an oxygen atom, a sulfur atom, or a methylene group; R1 is a C2-20 straight chain or branched chain hydrocarbon group which may have a substituent, or a ring-type hydrocarbon group which may have a hetero atom; and n is an integer of 0-5.] [Chemical Formula 1].