EXPOSURE EQUIPMENT, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide exposure equipment capable of suppressing leakage and infiltration of a liquid.SOLUTION: The exposure equipment, to expose a substrate by projecting a pattern image onto a substrate via a projection optical system and a liquid, comprises: a substrate holder to hold the substrate; a substrate stage which is movable while holding the substrate on a substrate holder; a detector to detect whether either the substrate or a dummy substrate is held on the substrate holder; and a controller to change a movable area of the substrate stage according to a detection result of the detector.