METHOD FOR PURIFYING RESIN FOR PHOTOLITHOGRAPHY

摘要

Provided is a method for purifying a resin for photolithography wherein, from an insufficiently purified resin (also referred to as “crude resin”), low molecular weight impurities such as an unreacted monomer and a polymerization initiator, which cause a development defect of a resist pattern or deterioration of the storage stability of the resin for photolithography can be removed more effectively. A method for purifying a resin for photolithography according to the present invention is characterized by comprising: an operation (a): an operation wherein a slurry in which a resin is dispersed in a solution containing a good solvent and a poor solvent is stirred; and then, an operation (b): an operation wherein, to said slurry, a poor solvent is added to lower the ratio of the good solvent to the poor solvent, and then, the resin is separated from the solution.

主权项

1. A method for purifying a resin for photolithography, the method comprising:
an operation (a): an operation wherein a slurry in which a resin is dispersed in a solution containing a good solvent and a poor solvent is stirred, and then, an operation (b): an operation wherein a poor solvent is added to said slurry to lower the ratio of the good solvent to the poor solvent, and then, the resin is separated from the solution.