PERIPHERY COATING APPARATUS, PERIPHERY COATING METHOD AND STORAGE MEDIUM THEREFOR

摘要

A periphery coating unit performs a scan-in process of moving a resist liquid nozzle 27 from an outside of an edge Wb of a wafer W to a position above a periphery region Wc of the wafer W while rotating the wafer W and discharging a resist liquid from the resist liquid nozzle 27; and a scan-out process of moving the resist liquid nozzle 27 from the position above the periphery region Wc of the wafer W to the outside of the edge Wb of the wafer W while rotating the wafer W and discharging the resist liquid from the resist liquid nozzle 27. Further, in the scan-out process, the resist liquid nozzle 27 is moved at a speed v2 lower than a speed v3 at which the resist liquid is moved to a side of the edge Wb of the wafer W.

主权项

1. A periphery coating apparatus that coats a coating liquid on a periphery region of a substrate, the apparatus comprising:
a rotatable holding unit configured to hold and rotate the substrate thereon horizontally; a coating liquid supply unit provided above the substrate, having a coating liquid nozzle that discharges a coating liquid downward, and configured to supply the coating liquid onto a surface of the substrate; a horizontal transfer unit configured to move the coating liquid nozzle in a horizontal direction; and a coating controller configured to control the rotatable holding unit, the coating liquid supply unit and the horizontal transfer unit, wherein the coating controller performs: a scan-in process of moving the coating liquid nozzle from an outside of an edge of the substrate to a position above the periphery region of the substrate by controlling the horizontal transfer unit while rotating the substrate by controlling the rotatable holding unit and discharging the coating liquid from the coating liquid nozzle by controlling the coating liquid supply unit, and a scan-out process of moving the coating liquid nozzle from the position above the periphery region of the substrate to the outside of the edge of the substrate by controlling the horizontal transfer unit while rotating the substrate by controlling the rotatable holding unit and discharging the coating liquid from the coating liquid nozzle by controlling the coating liquid supply unit, and when performing the scan-out process, the coating liquid nozzle is moved at a speed lower than a speed at which the coating liquid is moved to a side of the edge of the substrate.