| 摘要 |
This method for forming a liquid film on a substrate (10) comprises the following elements: - placing the substrate (10) in a chamber (12), and depositing a composition (14) on the substrate (10), the composition (14) comprising water, - introducing a volatile liquid (16) into the chamber (12), and - closing the chamber (12) for a predefined period, the volatile liquid (16) evaporating in the chamber (12) during this step during which the chamber is closed. The method further comprises extracting at last part of the vapour formed by the evaporation of the volatile liquid (16) out of the chamber (12), this extraction causing the composition (14) to spread over the substrate (10), said spread composition (14) then forming the liquid film on the substrate (10). |
