发明名称 |
COMBINATORIAL SPIN DEPOSITION |
摘要 |
A spin deposition apparatus includes a deposition mask configured to be arranged proximate a target substrate. The deposition mask includes at least one fluid reservoir offset from a rotational axis of the deposition mask and configured to hold fluid for dispersal on a portion of a surface of the target substrate. |
申请公布号 |
WO2014085307(A2) |
申请公布日期 |
2014.06.05 |
申请号 |
WO2013US71628 |
申请日期 |
2013.11.25 |
申请人 |
INTERMOLECULAR, INC. |
发明人 |
ENDO, RICHARD R.;KELEKAR, RAJESH |
分类号 |
B05D1/00;B05C11/08 |
主分类号 |
B05D1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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