<p>A power semiconductor device according to an embodiment of the present invention comprises: a second conductive type first junction termination extension (JTE) layer formed to be in contact with one side of a second conductive type well layer; a second conductive type second JTE layer formed on a same line of the second conductive type first JTE layer and to be spaced apart from the second conductive type first JTE layer in the longitudinal direction of a substrate; and a poly silicon layer formed to be in contact with the second conductive type well layer and the second conductive type first JTE layer.</p>
申请公布号
KR20140067445(A)
申请公布日期
2014.06.05
申请号
KR20120134700
申请日期
2012.11.26
申请人
SAMSUNG ELECTRO-MECHANICS CO., LTD.
发明人
SONG, IN HYUK;UM, KEE JU;JANG, CHANG SU;PARK, JAE HOON;SEO, DONG SOO