发明名称 APPARATUS FOR ALIGNING SUBSTRATE
摘要 <p>The present invention relates to a substrate aligning device which is characterized by including transferring units which transfer substrates; sensing units which sense the misalignment of the substrates; injecting units which inject high-pressure air to align the substrates in a preset direction; and a control unit which receives signals from the sensing units and then controls the operation of the injecting units. Therefore, by using high-pressure air, the substrate aligning device can minimize damage to the substrates that might occur in an existing mechanical aligning method.</p>
申请公布号 KR20140067422(A) 申请公布日期 2014.06.05
申请号 KR20120134629 申请日期 2012.11.26
申请人 HYDIS TECHNOLOGIES CO., LTD. 发明人 PARK, MAN WOO
分类号 H01L21/68;G02F1/13;H01L21/677 主分类号 H01L21/68
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