发明名称 |
APPARATUS FOR ALIGNING SUBSTRATE |
摘要 |
<p>The present invention relates to a substrate aligning device which is characterized by including transferring units which transfer substrates; sensing units which sense the misalignment of the substrates; injecting units which inject high-pressure air to align the substrates in a preset direction; and a control unit which receives signals from the sensing units and then controls the operation of the injecting units. Therefore, by using high-pressure air, the substrate aligning device can minimize damage to the substrates that might occur in an existing mechanical aligning method.</p> |
申请公布号 |
KR20140067422(A) |
申请公布日期 |
2014.06.05 |
申请号 |
KR20120134629 |
申请日期 |
2012.11.26 |
申请人 |
HYDIS TECHNOLOGIES CO., LTD. |
发明人 |
PARK, MAN WOO |
分类号 |
H01L21/68;G02F1/13;H01L21/677 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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