EXPOSURE MASK AND METHOD OF MANUFACTURING SUBSTRATE USING THE EXPOSURE MASK

摘要

An exposure mask includes a first transmission unit, a second transmission unit, and a blocking unit. The first transmission unit is disposed on a first area whereby a gate layer and a source/drain layer formed on the gate layer are disposed and passes the first energy of light to form a first contact hole which exposes the source/drain layer to an organic insulating film formed on the source/drain layer. The second transmission unit is disposed on a second area whereby the gate layer is exposed by the source/drain layer, exposes the gate layer to an organic insulating film formed on the gate layer, and passes the second energy of light greater than the first energy to form a second contact hole which is the same or greater than the first contact hole. The blocking unit is disposed on a boundary between the first area and the second area and blocks the light. Therefore, the defects of the substrate can be reduced.