发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which can reduce leakage current, reduce the number of masks which require correction at the time of logic revision, and prevent automatic routing in a spare cell.SOLUTION: A P&R tool uses a standard cell 1 including a buffer, and a spare cell 2 of the standard cell 1. In the spare cell 2, sources of P-channel MOS transistors P1, P2 is disconnected from a line of power supply voltage VDD and connected to a line of ground voltage VSS. The standard cell 1 and the spare cell 2 are different only in a wiring pattern in a first metal wiring layer. Accordingly, leakage current in the unused pare cell 2 can be reduced. In addition, when a mask for the first wiring metal wiring layer is corrected, the spare cell 2 can be replaced with the standard cell 1.
申请公布号 JP2014103254(A) 申请公布日期 2014.06.05
申请号 JP20120254335 申请日期 2012.11.20
申请人 RENESAS ELECTRONICS CORP 发明人 TADA AKIRA
分类号 H01L21/82;H01L21/822;H01L27/04 主分类号 H01L21/82
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