| 发明名称 |
METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS |
| 摘要 |
The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer. |
| 申请公布号 |
US2014151330(A1) |
申请公布日期 |
2014.06.05 |
| 申请号 |
US201414175203 |
申请日期 |
2014.02.07 |
| 申请人 |
YIN Jian;WU Hengpeng;THIYAGARAJAN Muthiah;HONG SungEun;NEISSER Mark;CAO Yi |
发明人 |
YIN Jian;WU Hengpeng;THIYAGARAJAN Muthiah;HONG SungEun;NEISSER Mark;CAO Yi |
| 分类号 |
B05D5/00;B05D3/00;B05D1/00 |
主分类号 |
B05D5/00 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. A method of forming a directed self assembly pattern comprising the steps of;
a. coating a substrate with a solution with reduced metal ion contamination content, wherein the solution comprises a block copolymer in a non aqueous solvent produced by
i. treating the solution with a basic ion exchange to form a slurry; and,ii. filtering the slurry to remove the ion exchange resin; b. heating the substrate to form a directed self assembly polymer layer; and c. removing one block of the block copolymer and thereby forming a pattern.
|
| 地址 |
Bridgewater NJ US |
