发明名称 COMPOSITION, INFRARED PASS FILTER AND METHOD FOR FABRICATING SAME, AND INFRARED SENSOR
摘要 Provided is a composition whereby it is possible to form an infrared pass filter which even when extremely thin (for example, a thickness of 1µm) is able to pass infrared beams (particularly near-infrared beams) therethrough with little noise originating from visible light components. The composition is configured such that when a film with a thickness of 1µm is formed, the maximum value of light transmissibility in the thickness direction of the film is in a range of wavelengths of 400-750nm is 20% or less and the minimum value of light transmissibility in the thickness direction of the film in a range of wavelengths of 900-1300nm is 90% or more. Also provided are an infrared pass filter, a method for manufacturing said infrared pass filter, and an infrared sensor, which employ said composition.
申请公布号 WO2014084147(A1) 申请公布日期 2014.06.05
申请号 WO2013JP81560 申请日期 2013.11.22
申请人 FUJIFILM CORPORATION 发明人 TAKISHITA HIROTAKA;KUGE TOSHIHITO;TAGUCHI YOSHINORI;TAGUCHI HIROSHI
分类号 G02B5/20;C08F2/50;G02B5/26;G03F7/004;G03F7/031;G03F7/033 主分类号 G02B5/20
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