发明名称 |
COMPOSITION, INFRARED PASS FILTER AND METHOD FOR FABRICATING SAME, AND INFRARED SENSOR |
摘要 |
Provided is a composition whereby it is possible to form an infrared pass filter which even when extremely thin (for example, a thickness of 1µm) is able to pass infrared beams (particularly near-infrared beams) therethrough with little noise originating from visible light components. The composition is configured such that when a film with a thickness of 1µm is formed, the maximum value of light transmissibility in the thickness direction of the film is in a range of wavelengths of 400-750nm is 20% or less and the minimum value of light transmissibility in the thickness direction of the film in a range of wavelengths of 900-1300nm is 90% or more. Also provided are an infrared pass filter, a method for manufacturing said infrared pass filter, and an infrared sensor, which employ said composition. |
申请公布号 |
WO2014084147(A1) |
申请公布日期 |
2014.06.05 |
申请号 |
WO2013JP81560 |
申请日期 |
2013.11.22 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
TAKISHITA HIROTAKA;KUGE TOSHIHITO;TAGUCHI YOSHINORI;TAGUCHI HIROSHI |
分类号 |
G02B5/20;C08F2/50;G02B5/26;G03F7/004;G03F7/031;G03F7/033 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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