EXPOSURE APPARATUS AND EXPOSURE METHOD

摘要

The present invention makes it possible to perform suitable exposure of a substrate (W) by accurately controlling, irrespective of a temperature change of the atmosphere, a position from which a laser beam is to be inputted to a spatial light modulator (41), and a position from which a laser beam is to be radiated to the substrate (W). Even if a temperature of the atmosphere is changed in a lighting system (S5), the position from which the light is to be inputted to the spatial light modulator (41) can be accurately adjusted by detecting an optical path change due to the temperature change, and correcting the optical path on the basis of the detection results. Even if a temperature of the atmosphere is changed in a projection system (S4), the position from which the laser beam is to be radiated to the substrate (W) can be accurately adjusted by detecting an optical path change due to the temperature change, and correcting the optical path on the basis of the detection results.