发明名称 |
METHOD OF COATING QUARTZ CRUCIBLE FOR GROWING SILICON CRYSTAL, AND QUARTZ CRUCIBLE FOR GROWING SILICON CRYSTAL |
摘要 |
A coating method for coating a crucible and a quartz crucible for growing a silicon crystal are provided. In the coating method, a bubble-free quartz layer which is 80 μm to 4 mm thick is formed on an inner surface of a crucible for growing a silicon crystal, and the surface of the bubble-free quartz layer is covered with alkaline earth hydroxide, following which heating is performed to a temperature at which the surface becomes devitrified. The surface may be covered by immersing the inner surface in a solution of the alkaline earth hydroxide. The heating may be performed before the crucible for growing silicon crystal is filled with a solid raw material to be melted. |
申请公布号 |
US2014150714(A1) |
申请公布日期 |
2014.06.05 |
申请号 |
US201114114002 |
申请日期 |
2011.12.02 |
申请人 |
Horioka Yukichi;Sakuragi Shiro |
发明人 |
Horioka Yukichi;Sakuragi Shiro |
分类号 |
C30B15/10 |
主分类号 |
C30B15/10 |
代理机构 |
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代理人 |
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主权项 |
1. A method of coating, comprising the steps of:
forming a bubble-free quartz layer having a thickness of 80 μm to 4 mm inclusive on an inner surface of a quartz crucible for growing a silicon crystal; covering the surface of the bubble-free quartz layer with alkaline earth hydroxide; and heating the surface to at least a temperature at which the surface becomes devitrified.
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地址 |
Chiba JP |