发明名称 METHOD OF COATING QUARTZ CRUCIBLE FOR GROWING SILICON CRYSTAL, AND QUARTZ CRUCIBLE FOR GROWING SILICON CRYSTAL
摘要 A coating method for coating a crucible and a quartz crucible for growing a silicon crystal are provided. In the coating method, a bubble-free quartz layer which is 80 μm to 4 mm thick is formed on an inner surface of a crucible for growing a silicon crystal, and the surface of the bubble-free quartz layer is covered with alkaline earth hydroxide, following which heating is performed to a temperature at which the surface becomes devitrified. The surface may be covered by immersing the inner surface in a solution of the alkaline earth hydroxide. The heating may be performed before the crucible for growing silicon crystal is filled with a solid raw material to be melted.
申请公布号 US2014150714(A1) 申请公布日期 2014.06.05
申请号 US201114114002 申请日期 2011.12.02
申请人 Horioka Yukichi;Sakuragi Shiro 发明人 Horioka Yukichi;Sakuragi Shiro
分类号 C30B15/10 主分类号 C30B15/10
代理机构 代理人
主权项 1. A method of coating, comprising the steps of: forming a bubble-free quartz layer having a thickness of 80 μm to 4 mm inclusive on an inner surface of a quartz crucible for growing a silicon crystal; covering the surface of the bubble-free quartz layer with alkaline earth hydroxide; and heating the surface to at least a temperature at which the surface becomes devitrified.
地址 Chiba JP
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