<p>A method of fabricating a zinc oxide (ZnO) thin film in which the surface shape of the ZnO thin film can be controlled during deposition of the ZnO thin film. The method includes depositing the ZnO thin film on a substrate by chemical vapor deposition (CVD). The CVD feeds an etching gas that etches the ZnO thin film concurrently with a source gas and an oxidizer gas, thereby controlling the surface shape of the ZnO thin film that is being deposited.</p>
申请公布号
EP2738287(A1)
申请公布日期
2014.06.04
申请号
EP20130193809
申请日期
2013.11.21
申请人
SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
发明人
YOON, GUN SANG;KIM, SEO HYUN;LEE, HYUNHEE;YOO, YOUNG ZO