A thin film-forming apparatus

摘要

A thin film-forming apparatus, which can ensure the uniform plane distribution of properties of a film formed on a substrate surface, is designed in such a manner that a gas-supply port (24a) for supplying a gas mixture from a gas-mixing chamber (24) to a shower head (25) is arranged at the peripheral portion on the bottom face of the gas-mixing chamber so that the gas mixture flows from the upper peripheral region of the head towards the center thereof and is further so designed that an exhaust port (32) for discharging the exhaust gas generated in the film-forming chamber (3) is arranged at a position lower than the level of a stage (31) during film-formation to thus direct the exhaust gas towards the side wall of the chamber (3) and to discharge the exhaust gas through the exhaust port. The stage (31) is designed so that is capable of freely going up and down to thus adjust the distance between the shower head (25) and substrate (S).