发明名称 QUANTITATIVE MEASUREMENT OF GAS PHASE PROCESS INTERMEDIATES USING RAMAN SPECTROSCOPY
摘要 <p>A method for quantitatively monitoring gas phase materials in a chemical process is provided and includes, providing a gaseous feed stream containing one or more reactant gases of interest; exposing the gaseous feed stream to coherent radiation from a Raman spectroscopic device; acquiring a Raman spectroscopic signal from each of the gaseous components in the feed stream; analyzing the spectroscopic signal to determine the presence and concentration of each of the gaseous components; and displaying the results of the analysis. In one embodiment, the method is useful for quantitatively monitoring gas phase materials in a process for making high purity silicon.</p>
申请公布号 EP2433113(B1) 申请公布日期 2014.06.04
申请号 EP20100720326 申请日期 2010.05.11
申请人 DOW CORNING CORPORATION;HEMLOCK SEMICONDUCTOR CORPORATION 发明人 HARMS, GREG;KRESZOWSKI, DOUGLAS;LICHT, DAVID;LIPP, ELMER;MOLNAR, MIKE;PINET, MARC
分类号 C01B33/027;G01N21/27;G01N21/65 主分类号 C01B33/027
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