发明名称 CHARGED PARTICLE BEAM MICROSCOPE AND METHOD OF MEASUREMENT EMPLOYING SAME
摘要 Disclosed are an electric charged particle beam microscope and electric charged particle beam microscopy capable of reducing the effect of specimen drift on images even for high-resolution, high-SNR imaging. The electric charged particle beam microscope includes an electric charged particle source; a condenser lens converging electric charged particles emitted from the electric charged particle source on a specimen; a deflector scanning the converged electric charged particles over the specimen; a control unit of the deflector; a specimen stage on which the specimen is mounted; a detector detecting the electric charged particles; a computer forming an image from a control signal from the deflector and an output signal from the detector; and a display part connected with the computer. The control unit of the deflector can change the scan rate of the electric charged particles. A first rate scan image is obtained at a first rate and a second rate scan image is obtained at a second rate slower than the first rate. The electric charged particle beam microscope further includes an analysis unit measuring the distortion of the second rate scan image by using the first rate scan image and compensating for the distortion.
申请公布号 EP2530699(A4) 申请公布日期 2014.06.04
申请号 EP20110734518 申请日期 2011.01.21
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 TSUNETA, RURIKO;KIKUCHI, HIDEKI
分类号 H01J37/22;H01J37/26;H01J37/28 主分类号 H01J37/22
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