| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To detect contaminations in slurry for polishing a semiconductor with high efficiency. <P>SOLUTION: Slurry is refined chemically, physically or in its combined manner, to collect contaminations contained therein with use of a collector containing fine holes and to detect them. When particles are very small in size but aggregated, it is difficult for the slurry to pass through the fine holes and the aggregates themselves disturb detection of contaminations. By a pretreatment, aggregates in the slurry can be made small in size. As shown by a before-pretreatment solution layer 6, prior to aggregate reduction, there are many aggregated particles 3, which disturb filtering and measurement thereof. Addition of a surfactant 5 causes the particles to be reduced in fine size, so that as shown by an after-pretreatment solution layer 7, fine sized particles 4 become major and thus filtering and measurement thereof become easy. Consequently, contaminations contained in the slurry can be detected stably, easily and efficiently. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
