POLYSILICON RECEPTACLE

摘要

To provide a polysilicon receptacle arranged at the lower part of a silicon melt-depositing reactor and receives the polysilicon therein without degenerating the surfaces of the polysilicon. The receptacle 15 is arranged at the lower part of the silicon melt-depositing reactor 1 to receive the polysilicon that melt-drips from the inner surface of the reactor 1. A surface-treating layer is formed on at least the inner surface of the receptacle 15 to prevent absorption or release of water content.