Exposure method, substrate stage, exposure apparatus, and device manufacturing method

摘要

An exposure method is proposed for exposing a substrate P by projecting an image of a pattern onto the substrate P via a projection optical system and a liquid 1, whereby side surface PB and underside surface PC of the substrate P are provided with liquid-repellent treatment. By such a configuration, during exposure of edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage is prevented.