发明名称 |
PLASMA CVD DEVICE |
摘要 |
<p>A plasma CVD apparatus of the present invention includes: a vacuum chamber; a vacuum exhaust unit that evacuates the vacuum chamber so that the inside becomes a vacuum state; a gas supply unit that supplies a source gas into the vacuum chamber; a plasma generation power supply that generates plasma in the source gas supplied into the vacuum chamber; a plurality of rotation holding units that hold the substrates in a spinning state; and a plurality of revolution mechanisms that revolve the plurality of rotation holding units around a revolution axis parallel to a shaft center and rotation axes of the rotation holding units, wherein the respective revolution mechanisms are divided as any one of a first group connected to one electrode of the plasma generation power supply and a second group connected to the other electrode of the plasma generation power supply.</p> |
申请公布号 |
EP2738288(A1) |
申请公布日期 |
2014.06.04 |
申请号 |
EP20120820626 |
申请日期 |
2012.07.25 |
申请人 |
KABUSHIKI KAISHA KOBE SEIKO SHO |
发明人 |
TAMAGAKI, HIROSHI;HAGA, JUNJI |
分类号 |
C23C16/458;C23C16/503;C23C16/509;H01J37/32 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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