发明名称 Method to grow group III-nitrides on copper using passivation layers
摘要 Group III-nitride epilayers can be grown directly on copper substrates using intermediate passivation layers. For example, single crystalline c-plane GaN can be grown on Cu (110) substrates with MOCVD. The growth relies on a low temperature AlN passivation layer to isolate any alloying reaction between Ga and Cu.
申请公布号 US8741748(B1) 申请公布日期 2014.06.03
申请号 US201313836594 申请日期 2013.03.15
申请人 Sandia Corporation 发明人 Li Qiming;Wang George T.;Figiel Jeffrey T.
分类号 H01L21/36 主分类号 H01L21/36
代理机构 代理人
主权项 1. A method to grow a Group III-nitride on a copper substrate, comprising: providing a copper substrate; growing a passivation layer on the copper substrate; and growing a Group III-nitride epilayer on the passivation layer by metal-organic chemical vapor deposition.
地址 Albuquerque NM US