发明名称 |
Method to grow group III-nitrides on copper using passivation layers |
摘要 |
Group III-nitride epilayers can be grown directly on copper substrates using intermediate passivation layers. For example, single crystalline c-plane GaN can be grown on Cu (110) substrates with MOCVD. The growth relies on a low temperature AlN passivation layer to isolate any alloying reaction between Ga and Cu. |
申请公布号 |
US8741748(B1) |
申请公布日期 |
2014.06.03 |
申请号 |
US201313836594 |
申请日期 |
2013.03.15 |
申请人 |
Sandia Corporation |
发明人 |
Li Qiming;Wang George T.;Figiel Jeffrey T. |
分类号 |
H01L21/36 |
主分类号 |
H01L21/36 |
代理机构 |
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代理人 |
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主权项 |
1. A method to grow a Group III-nitride on a copper substrate, comprising:
providing a copper substrate; growing a passivation layer on the copper substrate; and growing a Group III-nitride epilayer on the passivation layer by metal-organic chemical vapor deposition.
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地址 |
Albuquerque NM US |