| 发明名称 |
Force feedback leveling of tip arrays for nanolithography |
| 摘要 |
A method of leveling a polymer pen array includes contacting a pen array with a surface and measuring a total force exerted on the surface by the pen array, the pen array being disposed at a first angle with respect to a first axis of the surface and a second angle with respect to a second axis of the surface; tilting one or both of the pen array and the surface to vary the first and second angles of the pen array with respect to the surface; measuring the total force exerted by the tilted pen array on the surface; and repeating the tilting and measuring steps until a global maximum of the total force exerted on the surface by the pen array is measured, thereby determining first and second angles which correspond to a leveled position of the pen array with respect to the surface. |
| 申请公布号 |
US8745761(B2) |
申请公布日期 |
2014.06.03 |
| 申请号 |
US20100960439 |
申请日期 |
2010.12.03 |
| 申请人 |
Northwestern University |
发明人 |
Mirkin Chad A.;Liao Xing;Braunschweig Adam B. |
| 分类号 |
G01L1/06;G01N13/16;B05D3/12 |
主分类号 |
G01L1/06 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of leveling a pen array, comprising:
(a) contacting a pen array with a surface and measuring a total force exerted on the surface by the pen array, wherein
the surface has first and second axes, the first and second axes being parallel to the surface and perpendicular to one another,the pen array comprises a plurality of tips fixed to a common substrate layer, the tips and the common substrate layer being formed from an elastomeric polymer or elastomeric gel polymer, and the tips having a radius of curvature of less than about 1 μm, andthe pen array is disposed at a first angle with respect to the first axis of the surface and a second angle with respect to the second axis of the surface; (b) tilting one or both of the pen array and the surface to vary the first and second angles of the pen array with respect to the surface; (c) measuring the total force exerted by the tilted pen array of step (b) on the surface; and (d) repeating steps (b) and (c) until a global maximum of the total force exerted on the surface by the pen array is measured, thereby determining first and second angles which correspond to a leveled position of the pen array with respect to the surface.
|
| 地址 |
Evanston IL US |
