发明名称 |
Circuit, biasing scheme and fabrication method for diode accessed cross-point resistive memory array |
摘要 |
Methods, systems, structures and arrays are disclosed, such as a resistive memory array which includes access devices, for example, back-to-back Zener diodes, that only allow current to pass through a coupled resistive memory cell when a voltage drop applied to the access device is greater than a critical voltage. The array may be biased to reduce standby currents and improve delay times between programming and read operations. |
申请公布号 |
US8741728(B2) |
申请公布日期 |
2014.06.03 |
申请号 |
US201213614513 |
申请日期 |
2012.09.13 |
申请人 |
Micron Technology, Inc. |
发明人 |
Liu Jun;Porter David |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
1. A method comprising:
forming at least one access device, wherein the access device comprises one of back-to-back Zener diodes, a four-layer diode, and a Triac diode, by acts comprising: forming a first conductively-doped region having a first conductivity type over a region of a second conductivity type, changing the conductivity type of a portion of the first conductively-doped region from the first conductivity type to the second conductivity type and a second portion of the first conductivity type where are separated by the portion changed to the second conductivity type; and forming at least one resistive memory cell coupled to said at least one access device.
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地址 |
Boise ID US |