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1. A liquid processing apparatus, comprising:
a rotational unit configured to rotate a substrate to be processed while the substrate to be processed is being held horizontally; and a processing liquid supplying unit configured to supply a processing liquid to the bottom surface of the substrate to be processed which is rotating without supplying the processing liquid to the top surface thereof, wherein the rotational unit includes an enclosing member fixed to the rotational unit and configured to rotate with the substrate to be processed while surrounding the periphery of the substrate to be processed, the enclosing member includes a portion extended in a horizontal direction and is configured such that a gap is formed between the inner periphery of the enclosing member and the periphery of the substrate to be processed when the substrate to be processed is disposed on the rotational unit, the enclosing member includes a plurality of guide grooves formed on the bottom surface of the portion extended in the horizontal direction and configured to draw out the processing liquid being entered into the gap outwardly by a capillary action to prevent the processing liquid from going around and flowing onto the top surface of the substrate to be processed, and each of the plurality of guide grooves is configured to elongate outwardly from the inner periphery of the portion extended in the horizontal direction and is arranged with an interval from each other in the circumferential direction of the enclosing member.
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