Target supply device, extreme ultraviolet light generation apparatus, and method for supplying target

摘要

A target supply device is provided that may include a pair of rails arranged to face each other, the rails having electrically conductive properties, a target transport mechanism configured to supply a target material into a space between the rails and in contact with the rails, and a power supply connected to the rails and configured to supply a current to the target material through the rails. Methods and systems using the target supply device are also provided.

主权项

1. An apparatus for generating extreme ultraviolet light, the apparatus comprising:
a target supply device including a pair of rails arranged to face each other, the rails having electrically conductive properties, a target transport mechanism configured to supply a target material into a space between the rails, the target material to be in contact with the rails, and a power supply connected to the rails and configured to supply a current to the target material through the rails; a chamber provided with an inlet through which an externally supplied laser beam is introduced into the chamber; a laser beam focusing optical system for focusing the externally supplied laser beam in the chamber; a sensor for detecting a target outputted from the target supply device in the chamber; and a controller for controlling the target supply device based on a detection result of the sensor.