发明名称 Inspection apparatus
摘要 An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz. A central portion of the inspection object is provided with a central flat portion 390. The periphery of the central flat portion 390 is provided with peripheral flat portion 392 via a step 391. The periphery of the step 391 is provided with an electric field correction plate 400. A surface voltage equivalent to a surface voltage applied to the inspection object is applied to an electrode 401 on the electric field correction plate 400.
申请公布号 US8742344(B2) 申请公布日期 2014.06.03
申请号 US201314026385 申请日期 2013.09.13
申请人 Ebara Corporation 发明人 Hatakeyama Masahiro;Toma Yasushi;Yoshikawa Shoji;Tsukamoto Kiwamu
分类号 G01N23/00;G21K7/00 主分类号 G01N23/00
代理机构 代理人
主权项 1. An inspection apparatus, comprising: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles, wherein the primary optical system comprises a photoelectron generator having a photoelectronic surface, and a base material of the photoelectronic surface is made of material with a higher thermal conductivity than a thermal conductivity of quartz.
地址 Tokyo JP