Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern

摘要

Provided is an aromatic hydrocarbon resin with a high carbon concentration and a low oxygen concentration that can be used as a coating agent or a resist resin for semiconductors, as well as a composition for forming an underlayer film for photolithography with excellent etching resistance as an underlayer film for a multilayer resist process, an underlayer film formed from the composition, and a method for forming a pattern using the underlayer film. An aromatic hydrocarbon, an aromatic aldehyde, and a phenol derivative are reacted in the presence of an acidic catalyst to yield an aromatic hydrocarbon resin with a high carbon concentration of 90 to 99.9 mass % and a solubility in propylene glycol monomethyl ether acetate of 10 mass % or more.

主权项

1. An underlayer film forming composition for lithography, the composition being for forming an underlayer film between a substrate and a resist layer and comprising at least an aromatic hydrocarbon resin and an organic solvent, wherein the aromatic hydrocarbon resin is obtained by reacting an aromatic hydrocarbon represented by formula (1), an aldehyde represented by formula (2), and a phenol derivative represented by formula (3) in the presence of an acidic catalyst: wherein in formula (1), R represents hydrogen or an alkyl group having 1 to 4 carbon atoms; 1 and m each represent a number from 1 to 3; A represents a number from 0 to 2; and plural groups represented by R are the same or different from each other; wherein in formula (2), X represents hydrogen, an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, a cyclohexyl group, a hydroxyl group, a formyl group, or a carbonyl group; p and q each represent a number from 1 to 3; B represents a number from 0 to 2; and plural groups represented by X are the same or different from each other; and wherein in formula (3), Y and Z represent hydrogen, an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, or a cyclohexyl group; r and s each represent a number from 1 to 10; C represents a number from 0 to 2; and plural groups represented by Y and Z are the same or different from each other.