发明名称 Semiconductor device including a buffer layer structure for reducing stress
摘要 A semiconductor device includes a semiconductor chip, wiring that is included in the semiconductor chip and has a coupling part between parts with different widths, a pad being formed above the wiring and in a position overlapping the coupling part, a bump being formed on the pad, a buffer layer being formed in a position between the coupling part and the pad so as to cover the entire coupling part, and inorganic insulating layers being formed between the wiring and the buffer layer and between the buffer layer and the pad, respectively. The buffer layer is made of a material other than resin and softer than the inorganic insulating layer.
申请公布号 US8742601(B2) 申请公布日期 2014.06.03
申请号 US201314067404 申请日期 2013.10.30
申请人 Seiko Epson Corporation 发明人 Yuzawa Takeshi;Tagaki Masatoshi
分类号 H01L29/40;H01L21/44 主分类号 H01L29/40
代理机构 代理人
主权项 1. A semiconductor device comprising: a semiconductor chip; a wiring that is included in the semiconductor chip, the wiring having a first part and a second part, a first width of the first part being different from a second width of the second part, the wiring having a coupling part between the first part and the second part; a pad that is formed above the wiring and in a position overlapping the coupling part; a bump that is formed on the pad; a buffer layer that is formed in a position between the coupling part and the pad so as to cover the entire coupling part; a diffusion layer that is formed in a position below the second part; a first contact part that is formed in a position between the second part and the diffusion layer; and inorganic insulating layers that are formed between the wiring and the buffer layer and between the buffer layer and the pad, respectively, wherein the buffer layer is made of a material other than resin and softer than the inorganic insulating layer.
地址 Tokyo JP