发明名称 |
Reflective imaging optical system, exposure apparatus, and method for producing device |
摘要 |
An imaging optical system of the far pupil type, which is applicable to an exposure apparatus, is provided with six reflecting mirrors and forms an image of a first plane on a second plane. An incident pupil of the imaging optical system is positioned on a side opposite to the imaging optical system with the first plane intervening therebetween. A condition of −14.3<(PD/TT)/R←8.3 is fulfilled by a distance PD which is provided along an optical axis between the incident pupil and the first plane, a distance TT which is provided along the optical axis between the first plane and the second plane, and an angle of incidence R (rad) of a main light beam which comes into the first plane. |
申请公布号 |
US8743342(B2) |
申请公布日期 |
2014.06.03 |
申请号 |
US20100943236 |
申请日期 |
2010.11.10 |
申请人 |
Nikon Corporation |
发明人 |
Ono Takuro |
分类号 |
G03B27/42 |
主分类号 |
G03B27/42 |
代理机构 |
|
代理人 |
|
主权项 |
1. An exposure optical system comprising:
an illumination optical system configured to illuminate a pattern arranged on a first plane with a light from a light source; and a reflective imaging optical system configured to project an image of the pattern onto a photosensitive substrate arranged on a second plane,
wherein the reflective imaging optical system includes an incident pupil positioned on a side opposite to the reflective imaging optical system such that:
the first plane is located between the incident pupil and the reflective imaging optical system; anda condition of −14.3<(PD/TT)/R←8.3 is fulfilled, where PD represents a distance along an optical axis between the incident pupil and the first plane, TT represents a distance along the optical axis between the first-plane and the second plane, and R represents an angle of incidence (rad) of a main light beam incident on the first plane: andwherein the illumination optical system includes a plurality of first reflecting optical elements arranged in parallel and positioned on the incident pupil, and the illumination optical system superimposes a plurality of light beams on the first plane, the plurality of light beams being generated by reflection of the light by the first reflecting optical elements.
|
地址 |
Tokyo JP |