发明名称 Reflective imaging optical system, exposure apparatus, and method for producing device
摘要 An imaging optical system of the far pupil type, which is applicable to an exposure apparatus, is provided with six reflecting mirrors and forms an image of a first plane on a second plane. An incident pupil of the imaging optical system is positioned on a side opposite to the imaging optical system with the first plane intervening therebetween. A condition of −14.3<(PD/TT)/R←8.3 is fulfilled by a distance PD which is provided along an optical axis between the incident pupil and the first plane, a distance TT which is provided along the optical axis between the first plane and the second plane, and an angle of incidence R (rad) of a main light beam which comes into the first plane.
申请公布号 US8743342(B2) 申请公布日期 2014.06.03
申请号 US20100943236 申请日期 2010.11.10
申请人 Nikon Corporation 发明人 Ono Takuro
分类号 G03B27/42 主分类号 G03B27/42
代理机构 代理人
主权项 1. An exposure optical system comprising: an illumination optical system configured to illuminate a pattern arranged on a first plane with a light from a light source; and a reflective imaging optical system configured to project an image of the pattern onto a photosensitive substrate arranged on a second plane, wherein the reflective imaging optical system includes an incident pupil positioned on a side opposite to the reflective imaging optical system such that: the first plane is located between the incident pupil and the reflective imaging optical system; anda condition of −14.3<(PD/TT)/R←8.3 is fulfilled, where PD represents a distance along an optical axis between the incident pupil and the first plane, TT represents a distance along the optical axis between the first-plane and the second plane, and R represents an angle of incidence (rad) of a main light beam incident on the first plane: andwherein the illumination optical system includes a plurality of first reflecting optical elements arranged in parallel and positioned on the incident pupil, and the illumination optical system superimposes a plurality of light beams on the first plane, the plurality of light beams being generated by reflection of the light by the first reflecting optical elements.
地址 Tokyo JP