Method and composition of a dual sensitive resist

摘要

The present disclosure provides a sensitive material. The sensitive material includes a polymer that turns soluble to a base solution in response to reaction with acid; a plurality of photo-base generators (PBGs) that decompose to form base in response to radiation energy; and a thermal sensitive component that generates acid in response to thermal energy.

主权项

1. A lithography method, comprising:
forming a dual sensitive resist layer on a substrate, the dual sensitive resist layer including:
a polymer that turns soluble to a base solution in response to reaction with acid;a plurality of photo-base generators (PBGs) that decompose to form base in response to radiation energy; anda thermal sensitive component that includes a plurality of photo-quenchable-acid generators (PQ-AGs) that generate acid in response to thermal energy and are acid-quenchable in response to the radiation energy;exposing the dual sensitive resist layer to generate base and to disable acid generation in the dual sensitive resist layer within exposed regions;baking the exposed dual sensitive resist layer to generate acid within unexposed regions;neutralizing the base generated by the PQ-AGs and the acid generated by the PQ-AGs; anddeveloping the dual sensitive resist layer.