发明名称 |
LITHOGRAPHIC APPARATUS, SUBSTRATE SUPPORT SYSTEM, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM. |
摘要 |
A lithographic apparatus includes a driven object having compliant dynamics; a plurality of actuators configured to act on the driven object, wherein the plurality of actuators are over-determined in an actuator degree of freedom; a control system including a transformation matrix configured to generate controller output signals for each of the plurality of actuators in response to a setpoint, wherein the transformation matrix is configured such that the controller output signals do not excite the compliant dynamics of the driven object in at least one degree of freedom. |
申请公布号 |
NL1040514(A) |
申请公布日期 |
2014.06.02 |
申请号 |
NL20131040514 |
申请日期 |
2013.11.27 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
WAL MARINUS MARIA JOHANNES;AANGENENT WILHELMUS HENRICUS THEODORUS MARIA;KAMIDI RAMIDIN IZAIR;MANSSOURI KHALID |
分类号 |
G03F7/20;H01L21/683 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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