发明名称 |
Fremgangsmåde til fremstilling af et transparent og ledende metaloxidlag gennem pulserende, højioniserende magnetronsputtering |
摘要 |
A method for producing a transparent and conductive metal oxide layer on a substrate, includes atomizing at least one component of the metal oxide layer by highly ionized, high power pulsed magnetron sputtering to condense on the substrate. The pulses of the magnetron have a peak power density of more than 1.5 kW/cm2, the pulses of the magnetron have a duration of≰200μs, and the average increase in current density during ignition of the plasma within an interval, which is≰0.025 ms, is at least 106 A/(ms cm2). |
申请公布号 |
DK2300631(T3) |
申请公布日期 |
2014.06.02 |
申请号 |
DK20090761451T |
申请日期 |
2009.06.09 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
发明人 |
SITTINGER, FELIX;HORSTMANN, FELIX;SZYZSKA, BERND |
分类号 |
C23C14/35;C23C14/08;C23C14/58 |
主分类号 |
C23C14/35 |
代理机构 |
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代理人 |
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