发明名称 TRANSFER MASK FOR THE STRUCTURED EVAPORATION AND EVAPORATION METHOD USING THEREOF
摘要 The present invention relates to a transfer mask (1) for structured deposition of substrates (20) which has a transparent intermediate carrier (2); a method for producing the transfer mask; a deposition method; and a deposition apparatus which can be used in deposition using the transfer mask (1). A layer stack (13) is arranged on a back surface (14) of the intermediate carrier, and the layer stack has an absorption layer (6), and an evaporation layer (12) of materials to be continuously evaporated thereon. The layer stack (13) of the transfer mask (1) also has multiple spacers (7) so as to set a gap of the evaporation layer (12) with respect to the substrates (20) in non-evaporation areas. The spacers (7) are formed in the absorption layer, a spacer layer (11), or an intermediate layer (8) in the layer stack (13) so as to prevent a layer error in the deposited layer while providing transfer masks with a variable material and structure, particularly transfer masks for organic materials.
申请公布号 KR20140066646(A) 申请公布日期 2014.06.02
申请号 KR20130143011 申请日期 2013.11.22
申请人 VON ARDENNE ANLAGENTECHNIK GMBH 发明人 BURGHART MARKUS;HAASEMANN GEORG
分类号 G03F1/38;G03F1/68 主分类号 G03F1/38
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