半导体制程之薄膜形成装置及方法、与电脑可读取媒体,申请号TW094121450-传众专利搜索

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发明名称	半导体制程之薄膜形成装置及方法、与电脑可读取媒体
摘要
申请公布号	TWI440087	申请公布日期	2014.06.01
申请号	TW094121450	申请日期	2005.06.27
申请人	东京威力科创股份有限公司日本	发明人	长谷部一秀;周保华
分类号	H01L21/31	主分类号	H01L21/31
代理机构		代理人	陈长文台北市松山区敦化北路201号7楼
主权项
地址	日本

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