PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE

摘要

Provided is a photosensitive resin composition which is capable of providing an interlayer insulating film that has low dielectric constant and low moisture absorption, while maintaining high sensitivity. A photosensitive resin composition that contains: (A) a polymer component which contains a polymer that satisfies (A1) and/or (A2) described below; (B) a photoacid generator; and (C) a solvent. (A1) a polymer which has (a1) a constituent unit having a residue wherein an acid group is protected with an acid-decomposable group and (a4) a constituent unit represented by general formula (S) (A2) a polymer which has (a1) a constituent unit having a residue wherein an acid group is protected with an acid-decomposable group, and a polymer which has (a4) a constituent unit represented by general formula (S) (In formula (S), each of R1 and R2 represents a hydrogen atom, an unsubstituted alkyl group having 1-3 carbon atoms or a perfluoroalkyl group having 1-3 carbon atoms.)