发明名称 METHOD FOR PROCESSING TRANSPARENT CONDUCTIVE FILM
摘要 <p>In this method for processing a transparent conductive film (3), the transparent conductive film is formed using an organic metal gas-phase growth method, a hydrogen radical being generated inside the processing container and the transparent conductive film (3) being exposed to the hydrogen radical.</p>
申请公布号 WO2014080936(A1) 申请公布日期 2014.05.30
申请号 WO2013JP81268 申请日期 2013.11.20
申请人 TOKYO ELECTRON LIMITED 发明人 HARADA TAMOTSU;LIN JUN;HORIGUCHI TAKAHIRO;MORI HIROYUKI
分类号 H01L31/04;C23C16/56 主分类号 H01L31/04
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