METHODS OF FABRICATING SEMICONDUCTOR DEVICE AND RELATED DEVICE

摘要

A method for fabricating a semiconductor device and a related device comprises preparing a semiconductor substrate having a cell gate pattern on a cell area and a peripheral gate pattern on a peripheral area; forming a photosensitive pattern for exclusively exposing the peripheral area of the semiconductor substrate; forming an LDD area in the peripheral area; forming a sacrificial spacer on sides of the peripheral gate pattern and the photosensitive pattern through a low temperature ALD process; forming a source/drain area in the peripheral area; and removing the sacrificial spacer and the photosensitive pattern.